TP/OLED/Solar cell/Biometric

Low T type ITO etching paste

<80C/<8mins for 150 ohm ITO 

SiO2 etching paste

RT/~10mins

Cu etching paste

RT/~15mins

ITO film
150ohm/125um, 150ohm/50um, 70ohm/125um


Metal mesh

>87% (@550nm)(3um/180um/)    36 ohm (角度59) or 17 ohm (角度121)
>85% (@550nm)(5um/300um/)   6.6 ohm (角度90)
>83% (@550nm)(8um/300um/) 3.6ohm (角度90)
>76% (@550nm)(15um/250um/) 2 ohm (角度90) /6.8 ohm (角度45) /

1.6 ohm (角度135)


AG ink and AF ink 
 


UV peelable glue